The miniaturized alternate deposition option is designed to fit to all KSV2000 and KSV5000 systems either as an upgrade module or as an option for a new
instrument. The trough only needs 1 liter of subphase for successful measurements, and the size of the substrates that can be used for deposition is 17-45 mm. The unique features of the KSV alternate deposition instruments have been
preserved in this newly designed miniaturized option i.e.
- The trough system is absolutely contamination free (monolayer A and B canīt be mixed) as the compartments are independent troughs with boundaries.
- The trough contains a clean phase in between the compartments which allows built up of any alternating layer structure. Stacking order can be freely selected and the hardware won't restrict the freedom of selecting the stacking order.
- KSVīs alternate configuration enables the deposition of multiple substrates starting from the liquid phase from one monolayer experiment.
- Alternate dipper head can be used as a conventional dipper.
For more information do not hesitate to contact us or our distributors. |